Scientists have developed a method for generating fast, bright proton beams using a high-repetition-rate laser-plasma ...
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Plasma technique doubles etch rate for 3D NAND flash memoryUsing plasma to create deep, narrow channels "These processes ... One recent development involves keeping the wafer––the ...
This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...
With the right wastewater treatment strategies, companies can address these challenges while advancing their sustainability ...
A surprising discovery reveals that carbon nanotubes made from CO2 spontaneously create intense, stable plasma in ordinary ...
The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride.
While demands from highly advanced industries like semiconductors and aerospace are increasing, developments in plasma stability and energy efficiency are going on within the US DC plasma ...
The market size is expected to grow at a considerable CAGR, demonstrating the increasing adoption of DC plasma excitation solutions in different industry verticals across the globe. While demands from ...
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